Laser Ellipsometer
- Measurement: Thin film thickness, refractive index (n), and extinction coefficient (k) for single/multi-layer films.
- Light Source: High-stability 632.8 nm He-Ne Laser.
- Film Thickness Accuracy: 0.01 nm.
- Refractive Index Accuracy: 0.0001.
- Measurement Speed: 0.6 seconds per measurement.
- Sample Capacity: Up to 8-inch (200 mm) wafers with automatic optical alignment.
- Software: One-click measurement, advanced modeling, data analysis, and Excel/TXT report export.
- Applications: Thin-film characterization, semiconductor wafers, optical coatings, photovoltaic materials, and nanomaterial research
